Open AccessEffect of Neotame and pH on LiTaO3 Chemical Mechanical Polishing
Author(s) -
weilei Wang,
Qiufeng Xu,
Fan Xu,
Weili Liu,
Song Zhang
Publication year - 2022
Publication title -
ecs journal of solid state science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.488
H-Index - 51
eISSN - 2162-8777
pISSN - 2162-8769
DOI - 10.1149/2162-8777/ac6279
Subject(s) - chemical mechanical planarization , polishing , materials science , slurry , surface roughness , substrate (aquarium) , surface finish , composite material , optoelectronics , oceanography , geology
LiTaO 3 has piezoelectric, ferroelectric and pyroelectric optical properties with a broad transparent range from ultraviolet to infrared. In order to ensure good performance of the LiTaO 3 substrate, the surface of the LiTaO 3 substrate must be smooth. Chemical mechanical polishing has been used for planarization of integrated circuits or to obtain substrates of high surface quality. In this paper, neotame was studied as an additive for LiTaO 3 slurry, which plays an important role in the polishing process. In addition, this paper introduced that different pH and different concentrations of neotame have a strong influence on the polishing rate, and the surface roughness of the LiTaO 3 substrate after polishing is different, and the surface roughness of the LiTaO 3 substrate can be reduced to 0.112 nm. More importantly, neotame could improve the work-life of the polishing slurry and reduce the coefficient of friction, thereby reducing the fragmentation rate. Finally, the possible chemical reaction mechanism of neotame to accelerate polishing efficiency was given.