Open AccessCharged Particle Induced Etching and Functionalization of Two-Dimensional Materials
Author(s) -
Christopher Elbadawi,
Mehran Kianinia,
Avi Bendavid,
Charlene Lobo
Publication year - 2022
Publication title -
ecs journal of solid state science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.488
H-Index - 51
eISSN - 2162-8777
pISSN - 2162-8769
DOI - 10.1149/2162-8777/ac5eb2
Subject(s) - materials science , surface modification , etching (microfabrication) , nanotechnology , nanolithography , plasma etching , electron beam induced deposition , deposition (geology) , scanning electron microscope , nanostructure , reactive ion etching , boron nitride , chemical engineering , transmission electron microscopy , scanning transmission electron microscopy , fabrication , composite material , layer (electronics) , medicine , paleontology , alternative medicine , pathology , sediment , engineering , biology
Focused electron beam induced deposition and etching (FEBID and FEBIE) are direct-write nanofabrication techniques in which an electron beam is used to achieve nanostructure functionalization, etching or deposition. Either alone or in combination with in situ plasmas, these techniques can also be used to accelerate reactions that occur in ambient environment, with simultaneous high-resolution imaging. Here, we describe our recent work on etching, functionalization and directed assembly of a range of nano- and two-dimensional materials using temperature-dependent FEBIE experiments in an environmental scanning electron microscope (ESEM). As examples of the application of these techniques, we demonstrate processes for assembling arrays of nanodiamonds that can be used as magnetic field sensors, as well as for controlled etching of hexagonal boron nitride (hBN) and black phosphorus (BP).