Open AccessErratum: Mass Transfer Limited KOH Etching in Crystalline Silicon using a Confinement Mask [ ECS J. Solid State Sci. Technol. 9, 034013 (2020)]
Author(s) -
Kristianto Tjiptowidjojo,
Seok Jun Han,
Sang Eon Han,
Sang M. Han,
Peter Randall Schunk
Publication year - 2022
Publication title -
ecs journal of solid state science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.488
H-Index - 51
eISSN - 2162-8777
pISSN - 2162-8769
DOI - 10.1149/2162-8777/ac59c8
Subject(s) - materials science , solid state , etching (microfabrication) , optoelectronics , nanotechnology , engineering physics , engineering , layer (electronics)
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