Open AccessChemical Conditions of SiCNO Film Exposed to ClF3 Gas
Author(s) -
Kenta Hori,
Hiroki Kawakami,
Hitoshi Habuka
Publication year - 2021
Publication title -
ecs journal of solid state science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.488
H-Index - 51
eISSN - 2162-8777
pISSN - 2162-8769
DOI - 10.1149/2162-8777/ac2912
Subject(s) - x ray photoelectron spectroscopy , materials science , etching (microfabrication) , chemical vapor deposition , fluorine , nitrogen , chlorine , analytical chemistry (journal) , layer (electronics) , nitrogen gas , chemical engineering , nanotechnology , environmental chemistry , metallurgy , chemistry , organic chemistry , engineering
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