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Characteristics of In0.7Ga0.3As MOS Capacitors with Sulfur and Hydrazine Pretreatments
Author(s) -
Yao Jen Lee,
Sheng Ti Chung,
Chun Jung Su,
Ta Chun Cho,
Tien Sheng Chao
Publication year - 2021
Publication title -
ecs journal of solid state science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.488
H-Index - 51
eISSN - 2162-8777
pISSN - 2162-8769
DOI - 10.1149/2162-8777/ac2782
Subject(s) - materials science , x ray photoelectron spectroscopy , passivation , indium , oxide , dielectric , chemical vapor deposition , inorganic chemistry , capacitor , analytical chemistry (journal) , chemical engineering , optoelectronics , layer (electronics) , nanotechnology , metallurgy , chemistry , electrical engineering , chromatography , voltage , engineering

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