Open AccessSelective Electrodesorption-Based Atomic Layer Deposition (SEBALD) of Bismuth under Morphological Control
Author(s) -
Walter Giurlani,
Andrea Giaccherini,
Emanuele Salvietti,
Maurizio Passaponti,
Andrea Comparini,
Vittorio Morandi,
Fabiola Liscio,
Massimiliano Cavallini,
Massimo Innocenti
Publication year - 2018
Publication title -
the electrochemical society interface
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.568
H-Index - 46
eISSN - 1944-8783
pISSN - 1064-8208
DOI - 10.1149/2.f08182if
Subject(s) - bismuth , materials science , thin film , atomic layer deposition , crystallinity , chemical vapor deposition , crystallite , nanotechnology , chemical engineering , inorganic chemistry , chemistry , metallurgy , composite material , engineering
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