Open AccessPalladium Ultrathin Film Growth by Surface-Limited Redox Replacement of Cu and H UPD Monolayers: Approaches, Pros, Cons, and Comparison
Author(s) -
Nikolay Dimitrov,
Innocent Achari,
Stephen Ambrozik
Publication year - 2018
Publication title -
the electrochemical society interface
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.568
H-Index - 46
eISSN - 1944-8783
pISSN - 1064-8208
DOI - 10.1149/2.f06182if
Subject(s) - deposition (geology) , redox , monolayer , electrochemistry , materials science , nanotechnology , palladium , chemical engineering , electrode , atomic layer deposition , layer (electronics) , catalysis , chemistry , metallurgy , organic chemistry , engineering , paleontology , sediment , biology
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