Open AccessTowards Contact Resistance Minimization through CoSi2Formation Process Optimization on P-Doped Poly-Si by Hot Wall-Based Rapid Thermal Annealing
Author(s) -
Jin Yul Lee,
Hun Joo Kim,
Eun Jeong Kim,
Han Song,
Seung Jin Yeom,
Toshikazu Ishigaki,
Kitaek Kang,
Woo Sik Yoo
Publication year - 2015
Publication title -
ecs journal of solid state science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.488
H-Index - 51
eISSN - 2162-8777
pISSN - 2162-8769
DOI - 10.1149/2.0171507jss
Subject(s) - materials science , sheet resistance , annealing (glass) , doping , contact resistance , tungsten , wafer , dopant , dopant activation , spreading resistance profiling , electrical resistivity and conductivity , process window , secondary ion mass spectrometry , silicon , optoelectronics , composite material , analytical chemistry (journal) , ion , layer (electronics) , metallurgy , electrical engineering , physics , engineering , chemistry , lithography , quantum mechanics , chromatography