Towards Contact Resistance Minimization through CoSi2Formation Process Optimization on P-Doped Poly-Si by Hot Wall-Based Rapid Thermal Annealing | Zendy

Jin Yul Lee | Zendy; Hun Joo Kim | Zendy; Eun Jeong Kim | Zendy; Han Song | Zendy; Seung Jin Yeom | Zendy; Toshikazu Ishigaki | Zendy; Kitaek Kang | Zendy; Woo Sik Yoo | Zendy

Open Access

Towards Contact Resistance Minimization through CoSi₂Formation Process Optimization on P-Doped Poly-Si by Hot Wall-Based Rapid Thermal Annealing

Author(s) -

Jin Yul Lee,

Hun Joo Kim,

Eun Jeong Kim,

Han Song,

Seung Jin Yeom,

Toshikazu Ishigaki,

Kitaek Kang,

Woo Sik Yoo

Publication year - 2015

Publication title -

ecs journal of solid state science and technology

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.488

H-Index - 51

eISSN - 2162-8777

pISSN - 2162-8769

DOI - 10.1149/2.0171507jss

Subject(s) - materials science , sheet resistance , annealing (glass) , doping , contact resistance , tungsten , wafer , dopant , dopant activation , spreading resistance profiling , electrical resistivity and conductivity , process window , secondary ion mass spectrometry , silicon , optoelectronics , composite material , analytical chemistry (journal) , ion , layer (electronics) , metallurgy , electrical engineering , physics , engineering , chemistry , lithography , quantum mechanics , chromatography

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research