Open AccessDielectric Isolation of Silicon Through SEG/ELO In Trenches
Author(s) -
D. M. Boisvert
Publication year - 1989
Publication title -
ecs proceedings volumes
Language(s) - English
Resource type - Journals
eISSN - 2576-1579
pISSN - 0161-6374
DOI - 10.1149/198915.0334pv
Subject(s) - trench , materials science , shallow trench isolation , etching (microfabrication) , silicon , epitaxy , substrate (aquarium) , dielectric , optoelectronics , oxide , single crystal , optics , composite material , crystallography , chemistry , metallurgy , geology , layer (electronics) , oceanography , physics
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