Open AccessDielectric Isolation by Growth of Thick Silicon Films on Oxidized Si Wafers
Author(s) -
G. K. Celler
Publication year - 1987
Publication title -
ecs proceedings volumes
Language(s) - English
Resource type - Journals
eISSN - 2576-1579
pISSN - 0161-6374
DOI - 10.1149/198713.0241pv
Subject(s) - wafer , materials science , crystallization , epitaxy , dielectric , crystallite , polycrystalline silicon , silicon , optoelectronics , oxide , composite material , chemical engineering , metallurgy , layer (electronics) , engineering , thin film transistor
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