Open AccessElectrochemical Investigation of the Effect of Hydrogen Peroxide Concentration on Platinum-Particle-Assisted Etching of p-Type Silicon in a Hydrofluoric Acid Solution
Author(s) -
Ayumu Matsumoto,
Kyohei Furukawa,
Shun Majima,
Keishi Iwamoto,
Shinji Yae
Publication year - 2021
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1945-7111/ac330e
Subject(s) - hydrofluoric acid , etching (microfabrication) , mesoporous material , silicon , chemical engineering , materials science , platinum , hydrogen peroxide , electrochemistry , inorganic chemistry , isotropic etching , polarization (electrochemistry) , chemistry , layer (electronics) , nanotechnology , catalysis , metallurgy , electrode , organic chemistry , engineering
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom