z-logo
open-access-imgOpen Access
Numerical Analysis of CE Processes in RDE Systems: Diffusion and Electro-hydrodynamic Impedances
Author(s) -
Pedro Henrique Moura Leal,
Oswaldo E. Barcia,
O.R. Mattos
Publication year - 2020
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1945-7111/ab6282
Subject(s) - algorithm , diffusion , analytical chemistry (journal) , computer science , physics , thermodynamics , chemistry , chromatography
This paper presents a numerical analysis of the effect of different parameters (rotation speed, equilibrium constant and Schmidt numbers) on the diffusion (Z D ) and electro-hydrodynamic (Z EHD ) impedances of chemical-electrochemical (CE) systems in a rotating disk electrode (RDE) configuration. For this purpose, we used a finite difference algorithm to discretize and solve the governing equations. Our results show that the separation between convection-diffusion and reaction impedance loops depends on the ratio between diffusion layer thickness ( δ N ) and reaction layer thickness ( δ R ). Also, we have demonstrated that the characteristic frequency of the reaction impedance loop is a function of δ R − 2 . As for Z EHD data, we found that, for slow kinetics, the plots do not overlap for different rotation speeds. Further, the upper limit of the negative phase is different for both, slow and fast kinetics, from the usual 180° value found for single charge transfer systems. The increment of the equilibrium constant, obtained via increasing the reaction rate constant of the electroactive species, caused the magnitude Z D to decrease and that of Z EHD to increase. Lastly, we found that changing Sc A mainly affects the concentration gradient at the surface while the effect of Sc B will depend on the kinetic regime.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here