Open AccessALD and Characterization of Aluminum Oxide Deposited on Si(100) using Tris(diethylamino) Aluminum and Water Vapor
Author(s) -
Rajesh Katamreddy,
Ronald Inman,
Gregory Jursich,
Axel Soulet,
Christos G. Takoudis
Publication year - 2006
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.2239258
Subject(s) - x ray photoelectron spectroscopy , atomic layer deposition , fourier transform infrared spectroscopy , amorphous solid , oxide , aluminium , analytical chemistry (journal) , inorganic chemistry , materials science , chemistry , chemical engineering , thin film , nanotechnology , crystallography , metallurgy , organic chemistry , engineering
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