Open AccessA Measurement of the Effect of Intrinsic Film Stress on the Overall Rate of Thermal Oxidation of Silicon
Author(s) -
J. K. Srivastava,
E. A. Irene
Publication year - 1985
Publication title -
journal of the electrochemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.258
H-Index - 271
eISSN - 1945-7111
pISSN - 0013-4651
DOI - 10.1149/1.2113676
Subject(s) - silicon , thermal oxidation , materials science , stress (linguistics) , thermal , optoelectronics , thermodynamics , physics , linguistics , philosophy
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