Open AccessLow-Temperature Silicon Epitaxy for Atomic Precision Devices
Author(s) -
Evan M. Anderson,
Aaron M. Katzenmeyer,
Ting S. Luk,
DeAnna Campbell,
Michael Thomas Marshall,
Ezra Bussmann,
James Anthony Ohlhausen,
Ping Lu,
Paul G. Kotula,
Daniel R. Ward,
TzuMing Lu,
Shashank Misra
Publication year - 2019
Publication title -
ecs transactions
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.235
H-Index - 52
eISSN - 1938-6737
pISSN - 1938-5862
DOI - 10.1149/09301.0037ecst
Subject(s) - epitaxy , silicon , materials science , characterization (materials science) , ellipsometry , optoelectronics , nanotechnology , analytical chemistry (journal) , thin film , chemistry , layer (electronics) , chromatography
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