Effect of Two-Dimensionality on Step Bunching on a Si(001) Vicinal Face
Author(s) -
Masahide Sato,
Makio Uwaha,
Yukio Hirose
Publication year - 2006
Publication title -
journal of the physical society of japan
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.76
H-Index - 139
eISSN - 1347-4073
pISSN - 0031-9015
DOI - 10.1143/jpsj.75.043601
Subject(s) - vicinal , bunches , diffusion , curse of dimensionality , anisotropy , physics , drift velocity , condensed matter physics , materials science , electron , optics , nuclear physics , computer science , quantum mechanics , machine learning
We study the effect of two-dimensionality on step bunching on a Si(001) vicinal face heated by direct electric current. When the anisotropy of the diffusion coefficient changes alternately on consecutive terraces like a Si(001) vicinal face, bunching occurs with the drift of adatoms. If the wandering fluctuation of step bunches is neglected as in the one-dimensional model, the bunching with step-down drift is faster than that with step-up drift in contradiction with experiment (Latyshev et al.: Appl. Surf. Sci. 130-132 (1998) 139). In a two-dimensional model with a wide system width, the step bunches wander heavily with step-up drift, and the recombination of neighboring bunches occurs more frequently than those with step-down drift. The bunching with step-up drift is accelerated and can be faster than that with step-down drift. ©2006 The Physical Society of Japan.
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