Spectroscopic Measurement of DC Plasma Jet in Diamond Synthesis | Zendy

Satoshi Sakiyama | Zendy; Osamu Fukumasa | Zendy; Tomohide Murakami Tomohide Murakami | Zendy; Tsuyoshi Kobayashi Tsuyoshi Kobayashi | Zendy

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Spectroscopic Measurement of DC Plasma Jet in Diamond Synthesis

Author(s) -

Satoshi Sakiyama,

Osamu Fukumasa,

Tomohide Murakami Tomohide Murakami,

Tsuyoshi Kobayashi Tsuyoshi Kobayashi

Publication year - 1997

Publication title -

japanese journal of applied physics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.487

H-Index - 129

eISSN - 1347-4065

pISSN - 0021-4922

DOI - 10.1143/jjap.36.5003

Subject(s) - diamond , plasma , volumetric flow rate , chemical vapor deposition , deposition (geology) , substrate (aquarium) , analytical chemistry (journal) , jet (fluid) , morphology (biology) , hydrogen , chemistry , methane , materials science , nanotechnology , composite material , physics , paleontology , oceanography , genetics , organic chemistry , chromatography , quantum mechanics , sediment , geology , biology , thermodynamics

In synthesis of diamond with a plasma jet under medium pressure, the morphology of the deposited particles depends strongly on the ratio of the methane gas flow rate to the hydrogen gas flow rate and the distance from the feed ring exit to the substrate. The relationship between the morphology of the deposited particles and the chemical species in the plasma jet is studied by means of emission spectroscopy, with a view toward achieving large-area deposition at a high rate. The intensity ratio of the CH to the Hα spectrum is strongly correlated with the quality of the diamond synthesized and the deposition area

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