Open AccessThe Locus of Heat Resistance Confers Resistance to Chlorine and Other Oxidizing Chemicals in Escherichia coli
Author(s) -
Zhiying Wang,
Yuan Fang,
Shuai Zhi,
David J. Simpson,
Alexander Gill,
Lynn M. McMullen,
Norman F. Neumann,
Michael G. Gänzle
Publication year - 2019
Publication title -
applied and environmental microbiology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.552
H-Index - 324
eISSN - 1070-6291
pISSN - 0099-2240
DOI - 10.1128/aem.02123-19
Subject(s) - escherichia coli , chlorine , oxidizing agent , virulence , biology , locus (genetics) , microbiology and biotechnology , pathogenic escherichia coli , genetics , gene , chemistry , organic chemistry
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