Surface Self-Organization Caused by Dislocation Networks
Author(s) -
Konrad Thürmer,
R. Q. Hwang,
N. C. Bartelt
Publication year - 2006
Publication title -
science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 12.556
H-Index - 1186
eISSN - 1095-9203
pISSN - 0036-8075
DOI - 10.1126/science.1120224
Subject(s) - scanning tunneling microscope , monolayer , dislocation , materials science , chemical physics , surface (topology) , condensed matter physics , thermal stability , crystallography , quantum tunnelling , nanotechnology , chemistry , optoelectronics , composite material , physics , geometry , mathematics , organic chemistry
We report a new mechanism of self-organization that can lead to robust surface ordering. We have quantitatively analyzed the thermal motion of holes created by sulfur atoms in a silver monolayer on a ruthenium surface, which we observed in real time with scanning tunneling microscopy. We find that the stability of the array of holes is determined by the arrangement and structure of misfit dislocations in the film.
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