Open AccessWafer-scale freestanding vanadium dioxide film
Author(s) -
He Ma,
Xiao Xiao,
Yu Wang,
Yan Sun,
Bolun Wang,
Xinyu Gao,
Enze Wang,
Kaili Jiang,
Kai Li,
Xiaopeng Zhang
Publication year - 2021
Publication title -
science advances
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 5.928
H-Index - 146
ISSN - 2375-2548
DOI - 10.1126/sciadv.abk3438
Subject(s) - wafer , materials science , vanadium dioxide , etching (microfabrication) , nanotechnology , optoelectronics , insulator (electricity) , thin film , layer (electronics)
Wafer-scale freestanding VO2 films with high quality obtained in 6 min facilitate device integration.