Open AccessCooperative particle rearrangements facilitate the self-organized growth of colloidal crystal arrays on strain-relief patterns
Author(s) -
Manodeep Mondal,
Chandan K. Mishra,
Rajdeep Banerjee,
Shobharasimhan,
A. K. Sood,
Rajesh Ganapathy
Publication year - 2020
Publication title -
science advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.928
H-Index - 146
ISSN - 2375-2548
DOI - 10.1126/sciadv.aay8418
Subject(s) - strain (injury) , colloidal particle , particle (ecology) , materials science , fabrication , nanotechnology , colloid , colloidal crystal , self assembly , chemical physics , crystallography , chemical engineering , chemistry , biology , engineering , anatomy , ecology , medicine , alternative medicine , pathology
Strain-relief pattern formation in colloidal heteroepitaxy enables the fabrication of hierarchically ordered surface structures.
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