Open AccessUniform hierarchical MFI nanosheets prepared via anisotropic etching for solution-based sub–100-nm-thick oriented MFI layer fabrication
Author(s) -
Yi Liu,
Weili Qiang,
Taotao Ji,
Mu Zhang,
Mingrun Li,
Jinming Lu
Publication year - 2020
Publication title -
science advances
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 5.928
H-Index - 146
ISSN - 2375-2548
DOI - 10.1126/sciadv.aay5993
Subject(s) - fabrication , materials science , layer (electronics) , etching (microfabrication) , chemical engineering , anisotropy , nanotechnology , optics , medicine , alternative medicine , pathology , engineering , physics
Uniform high–aspect ratio hierarchical MFI nanosheets were prepared via facile anisotropic etching of coffin-shaped MFI crystals.
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