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Light wavelength effects in submicrometer phosphor materials using Mie scattering and Monte Carlo simulation
Author(s) -
Liaparinos P. F.
Publication year - 2013
Publication title -
medical physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.473
H-Index - 180
eISSN - 2473-4209
pISSN - 0094-2405
DOI - 10.1118/1.4821089
Subject(s) - monte carlo method , mie scattering , phosphor , wavelength , materials science , optics , scattering , diffusion , radius , light scattering , optoelectronics , physics , computer science , statistics , mathematics , computer security , thermodynamics
Purpose: Phosphor materials provide challenges to both fundamental research and breakthrough development of technologies in research areas. In recent years, with the development of science and technology in the field of materials, a number of physical or chemical synthesis methods have been developed and successfully used for the preparation of submicrometer‐sized phosphors. The present paper provides a rigorous analysis of light diffusion capabilities of phosphor materials in submicrometer‐scale investigating the effect of light wavelength.Methods: Mie scattering theory and Monte Carlo simulation techniques were used for the optical diffusion performance providing numerical calculations. The Monte Carlo model included: (i) phosphor layers composed of different thickness (200, 500, 1000 μ m) and (ii) different light wavelength values (420, 545, 610 nm) corresponding to different types of activators, such as Ce, Tb, and Eu activators, respectively.Results: Based on Mie calculations, it was found that for low values of refractive index (e.g., 1.4) and for particle radius from 250 up to 500 nm no significant variations occurred on optical parameters. Monte Carlo simulations showed that the resolution increases as light wavelength decreases, respectively, however, this increase is more obvious at lower thickness values (i.e., at 200 μ m). In particular, as light wavelength decreases from 610 down to 545 and 420 nm, the resolution increases 4.4% and 13.9%, respectively (at 200 μ m layer thickness). In addition, as layer thickness increases from 200 up to 500 μ m the resolution decreases 50.2% while an increase up to 1000 μ m causes a decrease of 70.2% (at 420 nm light wavelength).Conclusions: The goal of the authorˈs study was to investigate the optical diffusion characteristics of submicrometer phosphor materials using Mie scattering theory and Monte Carlo simulation. The present investigation indicated that a key parameter on resolution improvement was the amount of light loss which depends on the choice of activator and affects the lateral spreading.