Compensation of mask induced aberrations by projector wavefront control | Zendy

Peter Evanschitzky | Zendy; Feng Shao | Zendy; Tim Fühner | Zendy; Andreas Erdmann | Zendy

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Compensation of mask induced aberrations by projector wavefront control

Author(s) -

Peter Evanschitzky,

Feng Shao,

Tim Fühner,

Andreas Erdmann

Publication year - 2011

Publication title -

proceedings of spie, the international society for optical engineering/proceedings of spie

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.192

H-Index - 176

eISSN - 1996-756X

pISSN - 0277-786X

DOI - 10.1117/12.879207

Subject(s) - wavefront , optics , projector , compensation (psychology) , adaptive optics , computer science , focus (optics) , extreme ultraviolet lithography , optical aberration , projection (relational algebra) , zernike polynomials , lithography , deformable mirror , photolithography , physics , algorithm , psychology , psychoanalysis

Rigorous simulation of light diffraction from optical and EUV masks predicts phase effects with an aberration like impact on the imaging performance of lithographic projection systems. This paper demonstrates the application of advanced modeling and optimization methods for the compensation of mask induced aberration effects. It is shown that proper adjustment of the wavefront results in significant reduction of best focus differences between different features

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