Open AccessNanofabrication with a helium ion microscope
Author(s) -
Diederik Maas,
Emile van Veldhoven,
Ping Chen,
Vadim Sidorkin,
H. W. M. Salemink,
E. van der Drift,
Paul F. A. Alkemade
Publication year - 2010
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.862438
Subject(s) - nanolithography , field ion microscope , materials science , ion beam lithography , helium , focused ion beam , ion , microscope , ion beam , electron beam induced deposition , lithography , electron beam lithography , fabrication , optics , nanotechnology , optoelectronics , atomic physics , transmission electron microscopy , scanning transmission electron microscopy , beam (structure) , resist , physics , medicine , alternative medicine , pathology , quantum mechanics , layer (electronics)
The recently introduced helium ion microscope (HIM) is capable of imaging and fabrication of nanostructures thanks to its sub-nanometer sized ion probe [1,2]. The unique interaction of the helium ions with the sample material provides very localized secondary electron emission, thus providing a valuable signal for high-resolution imaging as well as a mechanism for very precise nanofabrication [3]. The low proximity effects, due to the low yield of backscattered ions and the confinement of the forward scattered ions into a narrow cone, enable patterning of ultra-dense sub-10 nm structures. This paper presents various nanofabrication results obtained with direct-write, with scanning helium ion beam lithography, and with helium ion beam induced deposition
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