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Fabrication of integrated lens pair test device
Author(s) -
Mark R. Mackenzie,
Chee Yee Kwok,
GangDing Peng
Publication year - 2005
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.582391
Subject(s) - fabrication , lens (geology) , computer science , test (biology) , materials science , optics , geology , physics , medicine , alternative medicine , pathology , paleontology
A silica microlens has been proposed which can be integrated with planar optical waveguide circuits. In order to fabricate the microlens, two deep silica etches must be performed. RIE is the prefered process as under certain conditions it is anisotropic. This paper reports on a study of different masking materials and plasma etch conditions trialed for the deep silica etch

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