Open AccessStudy of air-bubble-induced light scattering effect on image quality in 193-nm immersion lithography
Author(s) -
Yongfa Fan,
Neal Lafferty,
Anatoly Bourov,
Lena Zavyalova,
Bruce W. Smith
Publication year - 2004
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.537255
Subject(s) - immersion lithography , scattering , materials science , light scattering , optics , immersion (mathematics) , lithography , mie scattering , numerical aperture , polystyrene , wavelength , refractive index , resist , spheres , optoelectronics , nanotechnology , composite material , polymer , physics , layer (electronics) , pure mathematics , mathematics , astronomy
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