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Aerial Image Microscope for the inspection of defects in EUV masks
Author(s) -
Anton Barty,
John S. Taylor,
Russell M. Hudyma,
Eberhard Spiller,
Donald W. Sweeney,
Gilbert V. Shelden,
Jan-Peter Urbach
Publication year - 2002
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.467918
Subject(s) - extreme ultraviolet lithography , microscope , aerial image , optics , computer vision , microscopy , materials science , artificial intelligence , computer science , image (mathematics) , physics

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