Open Access<title>Process monitoring and control with CHEMIN, a miniaturized CCD-based instrument for simultaneous XRD/XRF analysis</title>
Author(s) -
D. T. Vaniman,
Douglas R. Bish,
George D. Guthrie,
S. J. Chipera,
David Blake,
S. A. Collins,
S. T. Elliott,
P. Sarrazin
Publication year - 1999
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.363687
Subject(s) - raw material , process engineering , process analytical technology , gypsum , process (computing) , computer science , manufacturing process , environmental science , materials science , chemistry , chemical engineering , metallurgy , engineering , bioprocess , organic chemistry , composite material , operating system
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