Open Access<title>Galvanic etching of silicon</title>
Author(s) -
C.M.A. Ashruf,
P.J. French,
P.M. Sarro,
J. J. Kelly
Publication year - 1998
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - Uncategorized
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.324329
Subject(s) - galvanic cell , etching (microfabrication) , silicon , fabrication , materials science , anode , optoelectronics , porous silicon , reactive ion etching , common emitter , nanotechnology , metallurgy , chemistry , electrode , medicine , alternative medicine , layer (electronics) , pathology
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