Open AccessFast 3D lithography simulation by convolutional neural network: POC study
Author(s) -
Hiroyoshi Tanabe,
Shimpei Sato,
Atsushi Takahashi
Publication year - 2020
Publication title -
tokyo tech research repository (tokyo institute of technology)
Language(s) - Uncategorized
Resource type - Conference proceedings
DOI - 10.1117/12.2575971
Subject(s) - extreme ultraviolet lithography , diffraction , optics , extreme ultraviolet , lithography , fourier transform , convolutional neural network , computer science , transformation (genetics) , physics , artificial intelligence , laser , biochemistry , chemistry , quantum mechanics , gene
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