Open AccessInfiltration synthesis of hybrid nanocomposite resists for advanced nanolithography
Author(s) -
Nikhil Tiwale,
Ashwanth Subramanian,
Kim Kisslinger,
Ming Lu,
Jiyoung Kim,
Aaron Stein,
ChangYong Nam
Publication year - 2020
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Conference proceedings
DOI - 10.1117/12.2552164
Subject(s) - resist , nanolithography , materials science , electron beam lithography , lithography , nanotechnology , nanocomposite , extreme ultraviolet lithography , photolithography , optoelectronics , layer (electronics) , fabrication , medicine , alternative medicine , pathology
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