Open AccessAtomically precise digital e-beam lithography
Author(s) -
John N. Randall,
James H. G. Owen,
Ehud Fuchs,
Rahul Saini,
Robin Santini,
S. O. Reza Moheimani
Publication year - 2020
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - Uncategorized
Resource type - Conference proceedings
DOI - 10.1117/12.2552083
Subject(s) - resist , nanolithography , fabrication , lithography , electron beam lithography , materials science , nanotechnology , stencil lithography , scanning tunneling microscope , etching (microfabrication) , optoelectronics , layer (electronics) , medicine , alternative medicine , pathology
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