Open AccessAnalysis of distinct scattering of extreme ultraviolet phase and amplitude multilayer defects with an actinic dark-field microscope
Author(s) -
Lukas Bahrenberg,
Stefan Herbert,
Jenny Tempeler,
Aleksey Maryasov,
Oskar Hofmann,
Serhiy Danylyuk,
R. Lebert,
Peter Loosen,
Larissa Juschkin
Publication year - 2015
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.2085929
Subject(s) - extreme ultraviolet lithography , extreme ultraviolet , optics , materials science , lithography , scattering , light scattering , amplitude , reflection (computer programming) , phase (matter) , microscope , blank , field (mathematics) , optoelectronics , physics , computer science , laser , quantum mechanics , programming language , mathematics , pure mathematics , composite material
The authors report on experimental and simulative scattering analyses of phase and amplitude defects found in extreme ultraviolet multilayer mirrors, such as mask blanks for EUV lithography. The goal of the analyses is to develop a novel mask blank inspection procedure using one single inspection tool that allows to determine whether a defect is a surface type (amplitude) defect, or a buried type (phase) defect. The experiments were carried out with an actinic dark-field reflection microscope. Programmed defects of both types were fabricated, using different nanostructuring techniques. Analytical and rigorous scattering simulations were carried out to predict and support the experimental results
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom