Yield-aware mask assignment using positive semi-definite relaxation in LELECUT triple patterning
Author(s) -
Yukihide Kohira,
Chikaaki Kodama,
Tomomi Matsui,
Atsushi Takahashi,
Shigeki Nojima,
Satoshi Tanaka
Publication year - 2015
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.2085285
Subject(s) - overlay , rounding , computer science , relaxation (psychology) , lithography , yield (engineering) , algorithm , boundary (topology) , function (biology) , topology (electrical circuits) , parallel computing , mathematics , materials science , optoelectronics , combinatorics , mathematical analysis , evolutionary biology , metallurgy , biology , psychology , social psychology , programming language , operating system
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