<title>Technique for the measurement of the in-situ development rate</title>
Author(s) -
P.G. Drennan,
Bruce W. Smith,
David W. Alexander
Publication year - 1994
Publication title -
proceedings of spie, the international society for optical engineering/proceedings of spie
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.192
H-Index - 176
eISSN - 1996-756X
pISSN - 0277-786X
DOI - 10.1117/12.174145
Subject(s) - wafer , interference (communication) , photoresist , wavelength , resist , algorithm , linear regression , robustness (evolution) , materials science , optics , development (topology) , computer science , optoelectronics , mathematics , nanotechnology , physics , chemistry , telecommunications , mathematical analysis , channel (broadcasting) , biochemistry , layer (electronics) , machine learning , gene
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