Yield-aware mask assignment by positive semidefinite relaxation in triple patterning using cut process | Zendy

Yukihide Kohira | Zendy; Chikaaki Kodama | Zendy; Tomomi Matsui | Zendy; Atsushi Takahashi | Zendy; Shigeki Nojima | Zendy; Satoshi Tanaka | Zendy

AI Assistant Blog Pricing

Open Access

Yield-aware mask assignment by positive semidefinite relaxation in triple patterning using cut process

Author(s) -

Yukihide Kohira,

Chikaaki Kodama,

Tomomi Matsui,

Atsushi Takahashi,

Shigeki Nojima,

Satoshi Tanaka

Publication year - 2016

Publication title -

journal of micro/nanolithography mems and moems

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.394

H-Index - 42

eISSN - 1932-5134

pISSN - 1932-5150

DOI - 10.1117/1.jmm.15.2.021207

Subject(s) - rounding , overlay , relaxation (psychology) , multiple patterning , computer science , node (physics) , algorithm , boundary (topology) , yield (engineering) , process (computing) , mathematical optimization , mathematics , topology (electrical circuits) , materials science , combinatorics , physics , resist , nanotechnology , mathematical analysis , psychology , social psychology , layer (electronics) , quantum mechanics , metallurgy , programming language , operating system

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom

About

About Careers Publisher Partners Contact Us Our institutional solutions Get Organisational Trial or Quote

Learn

FAQs Blog Terms of Use Privacy Policy

Download the Zendy App

Discover

Explore

Home ZAIA Blog