Open AccessLimiting factors for electron beam lithography when using ultra-thin hydrogen silsesquioxane layers
Author(s) -
Marco C. van der Krogt
Publication year - 2007
Publication title -
journal of micro/nanolithography mems and moems
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.394
H-Index - 42
eISSN - 1932-5134
pISSN - 1932-5150
DOI - 10.1117/1.2816459
Subject(s) - hydrogen silsesquioxane , resist , electron beam lithography , materials science , ammonium hydroxide , lithography , potassium hydroxide , silsesquioxane , stencil lithography , nanotechnology , optoelectronics , layer (electronics) , chemistry , composite material , inorganic chemistry , polymer , organic chemistry
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