Methods for the synthesis and purification of polycycloalkane candidates for photolithography immersion fluids at 193nm: requirements for removal of oxygen | Zendy

Juan LópezGejo | Zendy; Joy T. Kunjappu | Zendy; Will Conley | Zendy; Paul Zimmerman | Zendy; Nicholas J. Turro | Zendy

Open Access

Methods for the synthesis and purification of polycycloalkane candidates for photolithography immersion fluids at <inline-formula><math altimg="none" display="inline" overflow="scroll"><mrow><mn>193</mn><mspace width="0.3em" /><mi>nm</mi></mrow></math></inline-formula>: requirements for removal of oxygen

Author(s) -

Juan LópezGejo,

Joy T. Kunjappu,

Will Conley,

Paul Zimmerman,

Nicholas J. Turro

Publication year - 2007

Publication title -

journal of micro/nanolithography mems and moems

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.394

H-Index - 42

eISSN - 1932-5134

pISSN - 1932-5150

DOI - 10.1117/1.2778641

Subject(s) - immersion (mathematics) , impurity , chemistry , pyrene , cyclohexane , refractive index , immersion lithography , alkane , absorption (acoustics) , analytical chemistry (journal) , materials science , organic chemistry , hydrocarbon , optoelectronics , composite material , mathematics , layer (electronics) , pure mathematics , resist

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