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Van der Waals epitaxy and remote epitaxy of LiNbO3 thin films by pulsed laser deposition
Author(s) -
Rong Jia,
Hyun Kum,
Xin Sun,
Yuwei Guo,
Baiwei Wang,
Peijiao Fang,
Jie Jiang,
Daniel Gall,
T.M. Lu,
Morris Washington,
Jeehwan Kim,
Jian Shi
Publication year - 2021
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/6.0001109
Subject(s) - epitaxy , sapphire , materials science , mica , van der waals force , thin film , optoelectronics , pulsed laser deposition , raman spectroscopy , graphene , optics , laser , nanotechnology , chemistry , composite material , physics , organic chemistry , layer (electronics) , molecule

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