Open AccessHollow cathode plasma electron source for low temperature deposition of cobalt films by electron-enhanced atomic layer deposition
Author(s) -
Zachary C. Sobell,
Andrew S. Cavanagh,
David R. Boris,
Scott G. Walton,
Steven M. George
Publication year - 2021
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/6.0001033
Subject(s) - atomic layer deposition , cobalt , nucleation , materials science , cathode , analytical chemistry (journal) , deposition (geology) , desorption , transmission electron microscopy , thin film , chemistry , adsorption , nanotechnology , metallurgy , paleontology , organic chemistry , chromatography , sediment , biology