Open AccessOptimization of photoresist plating mold fabrication for metal mask patterning
Author(s) -
Doreen Hii,
Daryosh Vatanparvar,
Andrei Shkel
Publication year - 2021
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - English
Resource type - Journals
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/6.0000879
Subject(s) - photoresist , materials science , etching (microfabrication) , borosilicate glass , plating (geology) , fabrication , isotropic etching , optoelectronics , reactive ion etching , contact resistance , buffered oxide etch , ohmic contact , composite material , masking (illustration) , resist , layer (electronics) , medicine , alternative medicine , pathology , geophysics , geology , art , visual arts