Open AccessOptimization of photoresist plating mold fabrication for metal mask patterning
Author(s) -
Doreen Hii,
Daryosh Vatanparvar,
Andrei M. Shkel
Publication year - 2021
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - English
Resource type - Journals
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/6.0000879
Subject(s) - materials science , photoresist , etching (microfabrication) , borosilicate glass , plating (geology) , fabrication , optoelectronics , contact resistance , reactive ion etching , isotropic etching , composite material , photolithography , ohmic contact , nanotechnology , layer (electronics) , medicine , alternative medicine , pathology , geophysics , geology
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