Open AccessVacuum ultraviolet enhanced atomic layer etching of ruthenium films
Author(s) -
Brennan M. Coffey,
Himamshu C. Nallan,
John G. Ekerdt
Publication year - 2020
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/6.0000742
Subject(s) - x ray reflectivity , etching (microfabrication) , analytical chemistry (journal) , substrate (aquarium) , x ray photoelectron spectroscopy , ruthenium , materials science , layer (electronics) , torr , adsorption , thin film , chemistry , nanotechnology , chemical engineering , catalysis , oceanography , biochemistry , physics , chromatography , geology , engineering , thermodynamics