Open AccessSelective chemical vapor deposition of HfB2 on Al2O3 over SiO2 and the acceleration of nucleation on SiO2 by pretreatment with Hf[N(CH3)2]4
Author(s) -
Zhejun V. Zhang,
Sumeng Liu,
Gregory S. Girolami,
John R. Abelson
Publication year - 2021
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/6.0000691
Subject(s) - nucleation , coalescence (physics) , saturation (graph theory) , oxide , surface roughness , chemical vapor deposition , growth rate , metal , surface finish , analytical chemistry (journal) , materials science , chemistry , nanotechnology , metallurgy , composite material , organic chemistry , geometry , physics , mathematics , combinatorics , astrobiology