Open AccessLithium source for focused ion beam implantation and analysis
Author(s) -
Michael Titze,
Daniel Perry,
Elizabeth Auden,
Jose L Pacheco,
John Abraham,
Edward S. Bielejec
Publication year - 2021
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/6.0000645
Subject(s) - materials science , ion beam , focused ion beam , ion source , beam (structure) , semiconductor , ion beam deposition , ion implantation , ion , semiconductor detector , optoelectronics , lithium (medication) , semiconductor device , ion beam mixing , optics , detector , nanotechnology , physics , layer (electronics) , medicine , quantum mechanics , endocrinology
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