Open AccessLithium source for focused ion beam implantation and analysis
Author(s) -
Michael Titze,
Daniel Perry,
Elizabeth A. Auden,
Jose L Pacheco,
John Abraham,
Edward S. Bielejec
Publication year - 2021
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/6.0000645
Subject(s) - materials science , ion beam , focused ion beam , ion source , beam (structure) , ion beam deposition , semiconductor , ion implantation , ion , semiconductor device , optoelectronics , semiconductor detector , heterojunction , ion beam mixing , ion gun , detector , optics , nanotechnology , chemistry , physics , organic chemistry , layer (electronics)