Open AccessModified atomic layer deposition of MoS2 thin films
Author(s) -
Li Zeng,
Nathaniel E. Richey,
David W. Palm,
IlKwon Oh,
Jingwei Shi,
Callisto Maclsaac,
Thomas F. Jaramillo,
Stacey F. Bent
Publication year - 2020
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/6.0000641
Subject(s) - atomic layer deposition , molybdenum disulfide , annealing (glass) , materials science , stoichiometry , amorphous solid , molybdenum , chemical engineering , catalysis , transition metal , thin film , kinetics , nanotechnology , chemistry , metallurgy , crystallography , organic chemistry , physics , quantum mechanics , engineering