Open AccessSuperconformal growth and trench filling using a consumable inhibitor in chemical vapor deposition of Hf1−xVxBy
Author(s) -
Kinsey L. Canova,
Zhejun V. Zhang,
Gregory S. Girolami,
John R. Abelson
Publication year - 2020
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/6.0000640
Subject(s) - trench , materials science , chemical vapor deposition , growth rate , deposition (geology) , flux (metallurgy) , nanotechnology , chemical engineering , metallurgy , composite material , geology , layer (electronics) , sediment , engineering , paleontology , geometry , mathematics