Open AccessUltrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
Author(s) -
G. B. Rayner,
Noel O’Toole,
Jeffrey R. Shallenberger,
Blaine Johs
Publication year - 2020
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/6.0000454
Subject(s) - x ray photoelectron spectroscopy , materials science , atomic layer deposition , nitride , titanium , oxygen , titanium nitride , analytical chemistry (journal) , deposition (geology) , chemical engineering , thin film , layer (electronics) , metallurgy , composite material , nanotechnology , chemistry , environmental chemistry , paleontology , organic chemistry , sediment , engineering , biology
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom