Open AccessAchieving near-zero temperature coefficient of resistivity in atomic layer deposition TiSixN films through composition tuning
Author(s) -
Corbin Feit,
Srishti Chugh,
Ajit Dhamdhere,
Hae Young Kim,
Shaurya Dabas,
Somilkumar J. Rathi,
Niloy Mukherjee,
Parag Banerjee
Publication year - 2020
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/6.0000453
Subject(s) - van der pauw method , atomic layer deposition , electrical resistivity and conductivity , materials science , raman spectroscopy , x ray photoelectron spectroscopy , temperature coefficient , analytical chemistry (journal) , tin , thin film , ellipsometry , nanotechnology , hall effect , chemistry , composite material , optics , chemical engineering , metallurgy , physics , chromatography , electrical engineering , engineering