Achieving near-zero temperature coefficient of resistivity in atomic layer deposition TiSixN films through composition tuning | Zendy

Corbin Feit | Zendy; Srishti Chugh | Zendy; Ajit Dhamdhere | Zendy; Hae Young Kim | Zendy; Shaurya Dabas | Zendy; Somilkumar J. Rathi | Zendy; Niloy Mukherjee | Zendy; Parag Banerjee | Zendy

Open Access

Achieving near-zero temperature coefficient of resistivity in atomic layer deposition TiSixN films through composition tuning

Author(s) -

Corbin Feit,

Srishti Chugh,

Ajit Dhamdhere,

Hae Young Kim,

Shaurya Dabas,

Somilkumar J. Rathi,

Niloy Mukherjee,

Parag Banerjee

Publication year - 2020

Publication title -

journal of vacuum science and technology a vacuum surfaces and films

Language(s) - English

Resource type - Journals

eISSN - 1520-8559

pISSN - 0734-2101

DOI - 10.1116/6.0000453

Subject(s) - van der pauw method , atomic layer deposition , electrical resistivity and conductivity , materials science , raman spectroscopy , x ray photoelectron spectroscopy , temperature coefficient , analytical chemistry (journal) , tin , thin film , ellipsometry , nanotechnology , hall effect , chemistry , composite material , optics , chemical engineering , metallurgy , physics , chromatography , electrical engineering , engineering

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