Open AccessEffects of O2 addition on in-plasma photo-assisted etching of Si with chlorine
Author(s) -
Linfeng Du,
Emilia W. Hirsch,
Demetre J. Economou,
Vincent M. Donnelly
Publication year - 2020
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/6.0000338
Subject(s) - x ray photoelectron spectroscopy , etching (microfabrication) , analytical chemistry (journal) , plasma , reactive ion etching , torr , materials science , ion , inductively coupled plasma , chlorine , chemistry , layer (electronics) , nanotechnology , nuclear magnetic resonance , metallurgy , physics , organic chemistry , chromatography , quantum mechanics , thermodynamics